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タイトル: In situ imaging of microstructure formation in electronic interconnections
著者: Salleh, M. A. A. Mohd
Gourlay, C. M.
Xian, J. W.
Belyakov, S. A.
Yasuda, H.
McDonald, S. D.
Nogita, K.
著者名の別形: 安田, 秀之
発行日: 12-Jan-2017
出版者: Springer Nature
誌名: Scientific Reports
巻: 7
論文番号: 40010
抄録: The development of microstructure during melting, reactive wetting and solidification of solder pastes on Cu-plated printed circuit boards has been studied by synchrotron radiography. Using Sn-3.0Ag-0.5Cu/Cu and Sn-0.7Cu/Cu as examples, we show that the interfacial Cu6Sn5 layer is present within 0.05 s of wetting, and explore the kinetics of flux void formation at the interface between the liquid and the Cu6Sn5 layer. Quantification of the nucleation locations and anisotropic growth kinetics of primary Cu6Sn5 crystals reveals a competition between the nucleation of Cu6Sn5 in the liquid versus growth of Cu6Sn5 from the existing Cu6Sn5 layer. Direct imaging confirms that the β-Sn nucleates at/near the Cu6Sn5 layer in Sn-3.0Ag-0.5Cu/Cu joints.
著作権等: © The Author(s) 2017. This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
URI: http://hdl.handle.net/2433/218744
DOI(出版社版): 10.1038/srep40010
PubMed ID: 28079120
出現コレクション:学術雑誌掲載論文等

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