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BibliographyContents
Radical kinetics for polymer film deposition in fluorocarbon (C4F8, C3F6 and C5F8) plasmas
  Takahashi, K, Itoh, A, Nakamura, T, Tachibana, K (2000)
  THIN SOLID FILMS, 374(2): 303-310
Reaction mechanism of a lanthanum precursor in liquid source metalorganic chemical vapor deposition
  Nakamura, T, Nishimura, T, Tai, R, Tachibana, K (2005)
  MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 118(1-3): 253-258
Plasma enhanced chemical vapor deposition of fluorinated amorphous carbon films on the surface with reverse tapered microstructures
  Shirafuji, T, Wada, T, Kashiwagi, M, Nakamura, T, Tachibana, K (2003)
  JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 42(7A): 4504-4509
Plasma copolymerization of C6F6/C5F8 for application of low-dielectric-constant fluorinated amorphous carbon films and its gas-phase diagnostics using in situ Fourier transform infrared spectroscopy
  Shirafuji, T, Tsuchino, A, Nakamura, T, Tachibana, K (2004)
  JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 43(5A): 2697-2703
Thermal decomposition mechanism of a titanium source, Ti-(MPD)-(METHD)(2), in MOCVD
  Nakamura, T, Nishimura, T, Tachibana, K (2004)
  JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 151(12): C806-C810
Formation mechanism of strontium and titanium oxide films by metalorganic chemical vapor deposition: An isotopic labeling study using O-18(2)
  Nakamura, T, Momose, S, Tachibana, K (2001)
  JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 40(11): 6619-6622
Quantum chemical study on decomposition and polymer deposition in perfluorocarbon plasmas: Molecular orbital calculations of excited states of perfluorocarbons
  Nakamura, T, Motomura, H, Tachibana, K (2001)
  JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 40(2A): 847-854
Composition control of manganite perovskites in metalorganic chemical vapor deposition with in situ spectroscopic monitoring
  Nakamura, T, Tai, R, Nishimura, T, Tachibana, K (2005)
  JOURNAL OF APPLIED PHYSICS, 97(10)
Reaction mechanism of alkoxy derivatives of titanium diketonates as source molecules in liquid source metalorganic chemical vapor deposition of (Ba,Sr)TiO3 films: A study by in situ infrared absorption spectroscopy
  Nakamura, T, Momose, S, Sahara, R, Tachibana, K (2002)
  JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 41(11B): 6624-6627
Effects of O-2 gas on reaction mechanisms in the chemical vapor deposition of (Ba,Sr)TiO3 thin film
  Yamamuka, M, Momose, S, Nakamura, T, Tachibana, K, Takada, H (2002)
  JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 41(4A): 2231-2240