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| 書誌情報 | ファイル |
|---|---|
| Reaction mechanism of a lanthanum precursor in liquid source metalorganic chemical vapor deposition Nakamura, T; Nishimura, T; Tai, R; Tachibana, K (2005) MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 118(1-3): 253-258 | |
| Plasma copolymerization of C6F6/C5F8 for application of low-dielectric-constant fluorinated amorphous carbon films and its gas-phase diagnostics using in situ Fourier transform infrared spectroscopy Shirafuji, T; Tsuchino, A; Nakamura, T; Tachibana, K (2004) JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 43(5A): 2697-2703 | |
| Plasma enhanced chemical vapor deposition of fluorinated amorphous carbon films on the surface with reverse tapered microstructures Shirafuji, T; Wada, T; Kashiwagi, M; Nakamura, T; Tachibana, K (2003) JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 42(7A): 4504-4509 |
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