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Title: Free-standing C-60 nanowire fabricated using XeF2 sacrificial dry etching
Authors: Tsuchiya, Toshiyuki  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0002-7846-5831 (unconfirmed)
Ura, Yasutake
Jomori, Tomoya
Sugano, Koji
Tabata, Osamu  KAKEN_id
Keywords: fullerene (C-60)
nanowire
electron beam lithography
sacrificial etching
XeF2
Issue Date: 2009
Publisher: SPIE-SOC PHOTOPTICAL INSTRUMENTATION ENGINEERS
Journal title: JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
Volume: 8
Issue: 1
Thesis number: 013020
URI: http://hdl.handle.net/2433/109284
DOI(Published Version): 10.1117/1.3094745
Link: Web of Science
Appears in Collections:Graduate School of Engineering Literature Database

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