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    Please use this identifier to cite or link to this item: http://hdl.handle.net/2433/109612
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dc.contributor.authorAlfieri, G.en
dc.contributor.authorKimoto, T.en
dc.date.accessioned2010-04-19T05:59:58Z-
dc.date.available2010-04-19T05:59:58Z-
dc.date.issued2009-
dc.identifier.issn0370-1972-
dc.identifier.urihttp://hdl.handle.net/2433/109612-
dc.language.isoeng-
dc.publisherWILEY-V C H VERLAG GMBHen
dc.titleSingle versus double ion implantation a deep level studyen
dc.typejournal article-
dc.type.niitypeJournal Article-
dc.identifier.jtitlePHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICSen
dc.identifier.volume246-
dc.identifier.issue2-
dc.identifier.spage402-
dc.identifier.epage406-
dc.relation.doi10.1002/pssb.200844342-
dc.textversionnone-
dcterms.accessRightsmetadata only access-
Appears in Collections:Graduate School of Engineering Literature Database

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