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タイトル: | Soft processing for formation of self-assembled monolayer on hydrogen-terminated silicon surface based on visible-light excitation |
著者: | Sano, Hikaru Yaku, Tomohiro Ichii, Takashi ![]() ![]() ![]() Murase, Kuniaki ![]() ![]() ![]() Sugimura, Hiroyuki ![]() |
著者名の別形: | 佐野, 光 夜久, 智広 一井, 崇 邑瀬, 邦明 杉村, 博之 |
発行日: | Mar-2009 |
出版者: | American Vacuum Society |
引用: | Hikaru Sano, Tomohiro Yaku, Takashi Ichii, Kuniaki Murase, and Hiroyuki Sugimura. Soft processing for formation of self-assembled monolayer on hydrogen-terminated silicon surface based on visible-light excitation. Journal of Vacuum Science & Technology B. 2009, 27(2), 858-862. |
誌名: | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures |
巻: | 27 |
号: | 2 |
開始ページ: | 858 |
終了ページ: | 862 |
抄録: | Visible-light irradiation has been employed to promote a chemical reaction of 1-hexadecene with hydrogen-terminated silicon, yielding alkyl chains directly immobilized on bulk silicon surface. The resulting monolayer, that is, one type of self-assembled monolayer, was examined with water contact angle measurements, x-ray photoelectron spectroscopy, atomic force microscopy, and ellipsometry. While a part of the silicon surface was oxidized during the reaction, it was demonstrated that a compact monolayer was successfully formed both on p- and n-typed silicon substrates regardless of doping density. |
著作権等: | © 2009 American Vacuum Society This is not the published version. Please cite only the published version. この論文は出版社版でありません。引用の際には出版社版をご確認ご利用ください。 |
URI: | http://hdl.handle.net/2433/123515 |
DOI(出版社版): | 10.1116/1.3065485 |
出現コレクション: | 学術雑誌掲載論文等 |

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