このアイテムのアクセス数: 459

このアイテムのファイル:
ファイル 記述 サイズフォーマット 
1.3065485.pdf1 MBAdobe PDF見る/開く
タイトル: Soft processing for formation of self-assembled monolayer on hydrogen-terminated silicon surface based on visible-light excitation
著者: Sano, Hikaru
Yaku, Tomohiro
Ichii, Takashi  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0002-4021-8894 (unconfirmed)
Murase, Kuniaki  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0002-7564-9416 (unconfirmed)
Sugimura, Hiroyuki  KAKEN_id
著者名の別形: 佐野, 光
夜久, 智広
一井, 崇
邑瀬, 邦明
杉村, 博之
発行日: Mar-2009
出版者: American Vacuum Society
引用: Hikaru Sano, Tomohiro Yaku, Takashi Ichii, Kuniaki Murase, and Hiroyuki Sugimura. Soft processing for formation of self-assembled monolayer on hydrogen-terminated silicon surface based on visible-light excitation. Journal of Vacuum Science & Technology B. 2009, 27(2), 858-862.
誌名: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
巻: 27
号: 2
開始ページ: 858
終了ページ: 862
抄録: Visible-light irradiation has been employed to promote a chemical reaction of 1-hexadecene with hydrogen-terminated silicon, yielding alkyl chains directly immobilized on bulk silicon surface. The resulting monolayer, that is, one type of self-assembled monolayer, was examined with water contact angle measurements, x-ray photoelectron spectroscopy, atomic force microscopy, and ellipsometry. While a part of the silicon surface was oxidized during the reaction, it was demonstrated that a compact monolayer was successfully formed both on p- and n-typed silicon substrates regardless of doping density.
著作権等: © 2009 American Vacuum Society
This is not the published version. Please cite only the published version.
この論文は出版社版でありません。引用の際には出版社版をご確認ご利用ください。
URI: http://hdl.handle.net/2433/123515
DOI(出版社版): 10.1116/1.3065485
出現コレクション:学術雑誌掲載論文等

アイテムの詳細レコードを表示する

Export to RefWorks


出力フォーマット 


このリポジトリに保管されているアイテムはすべて著作権により保護されています。