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| ファイル | 記述 | サイズ | フォーマット | |
|---|---|---|---|---|
| IBA19_Proceedings.pdf | 243.73 kB | Adobe PDF | 見る/開く |
| タイトル: | Precise nitrogen depth profiling by high-resolution RBS in combination with angle-resolved XPS |
| 著者: | Kimura, Kenji  Nakajima, Kaoru   https://orcid.org/0000-0002-5390-1262 (unconfirmed)Conard, Thierry Vandervorst, Wilfried Bergmaier, Andreas Dollinger, Günther |
| 著者名の別形: | 木村, 健二 |
| キーワード: | High-resolution RBS Angle-resolved XPS Nitrogen depth profiling Combination analysis |
| 発行日: | Jun-2010 |
| 出版者: | Elsevier B.V. |
| 誌名: | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms |
| 巻: | 268 |
| 号: | 11-12 |
| 開始ページ: | 1960 |
| 終了ページ: | 1963 |
| 抄録: | Nitrogen depth profiling in a high-k gate stack structure, SiON/HfO2/SiON/Si(0 0 1) was performed by high-resolution Rutherford backscattering spectroscopy (HRBS) in combination with angle-resolved X-ray photoelectron spectroscopy (AR-XPS). The nitrogen depth profile is determined so that both the HRBS spectrum and the angular dependence of the XPS yield are reproduced. The obtained nitrogen profile is compared with the result of high-resolution elastic recoil detection (ERD) which is the most reliable technique for depth profiling of light elements. The agreement between the result of the present combination analysis and that of high-resolution ERD is fairly good, showing that the present combination analysis is a promising method for the analysis of light elements. |
| 著作権等: | © 2010 Elsevier B.V. This is not the published version. Please cite only the published version. この論文は出版社版でありません。引用の際には出版社版をご確認ご利用ください。 |
| URI: | http://hdl.handle.net/2433/126727 |
| DOI(出版社版): | 10.1016/j.nimb.2010.02.108 |
| 出現コレクション: | 学術雑誌掲載論文等 |
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