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タイトル: | Modeling of field- and time-dependent resistance change phenomena under electrical stresses in Fe–O films |
著者: | Eriguchi, Koji ![]() ![]() ![]() Wei, Zhiqiang Takagi, Takeshi Ono, Kouichi ![]() |
著者名の別形: | 江利口, 浩二 |
キーワード: | anodes current density electrical resistivity iron compounds thin films |
発行日: | Jan-2010 |
出版者: | American Institute of Physics |
誌名: | Journal of Applied Physics |
巻: | 107 |
号: | 1 |
論文番号: | 014518 |
抄録: | An electrical stress-induced resistance change in an Fe–O film was studied in detail. Under constant voltage stress (CVS) and constant current injection, the resistance of the Fe–O film abruptly increased. The observed time-to-resistance increase (tr) was found to depend on the applied voltage as well as on the injected current density. The total input energy until tr also depended on the applied voltage. From these observations, the mechanisms of resistance change are considered to obey a field-enhanced reaction, and this resistance increase is attributed to a high-resistive Fe–O layer formation at the interface between the anode electrode and the low-resistive Fe–O layer. We proposed a simplified two-step model for the time evolution of the current under CVS [ICVS(t)]. The predicted ICVS(t) showed a good agreement with experimental results. The model also explained the field dependence of tr. |
著作権等: | © 2010 American Institute of Physics |
URI: | http://hdl.handle.net/2433/137215 |
DOI(出版社版): | 10.1063/1.3273405 |
出現コレクション: | 学術雑誌掲載論文等 |

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