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タイトル: | Field and polarity dependence of time-to-resistance increase in Fe–O films studied by constant voltage stress method |
著者: | Eriguchi, Koji ![]() ![]() ![]() Wei, Zhiqiang Takagi, Takeshi Ohta, Hiroaki Ono, Kouichi ![]() |
著者名の別形: | 江利口, 浩二 |
キーワード: | electrical conductivity iron compounds sputter deposition switching thermomechanical treatment thin films |
発行日: | Jan-2009 |
出版者: | American Institute of Physics |
誌名: | Applied Physics Letters |
巻: | 94 |
号: | 1 |
論文番号: | 013507 |
抄録: | Constant voltage stress (CVS) was applied to Fe–O films prepared by a sputtering process to investigate a stress-induced resistance increase leading to a fundamental mechanism for switching behaviors. Under the CVS, an abrupt resistance increase was found for both stress polarities. A conduction mechanism after the resistance increase exhibited non-Ohmic transport. The time-to-resistance increase (tr) under the CVS was revealed to strongly depend on stress voltage as well as the polarity. From a polarity-dependent resistance increase determined by a time-zero measurement, the voltage and polarity-dependent tr were discussed on the basis of field- and structure-enhanced thermochemical reaction mechanisms. |
著作権等: | © 2009 American Institute of Physics |
URI: | http://hdl.handle.net/2433/137216 |
DOI(出版社版): | 10.1063/1.3064127 |
出現コレクション: | 学術雑誌掲載論文等 |

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