|Title:||A New Spectrophotometer System for Measuring Hemispherical Reflectance and Normal Emittance of Real Surfaces Simultaneously|
|Author's alias:||若林, 英信|
|Publisher:||Springer Science+Business Media, LLC.|
|Journal title:||International Journal of Thermophysics|
|Abstract:||A new spectrophotometer system is developed for the study of thermal radiation characteristics of real surfaces in thermal engineering environments. The system measures spectra of normal incidence hemispherical reflectance RNH and normal emittance EN in the near-ultraviolet through infrared region of wavelength of 0.30 μm to 11 μm simultaneously and repeatedly with a cycle time of 4 s. The system enables evaluation of the normal incidence absorptance AN in this wide spectral region. Transitions of spectra of specular-finished and rough-finished nickel surfaces in a high-temperature air-oxidation process are measured to demonstrate the performance of the system. Clear interference behaviors are found even in the spectra of hemispherical reflectance RNH and emittance EN of a rough-finished surface.|
|Rights:||The final publication is available at www.springerlink.com|
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|Appears in Collections:||Journal Articles|
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