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タイトル: | A New Spectrophotometer System for Measuring Hemispherical Reflectance and Normal Emittance of Real Surfaces Simultaneously |
著者: | Makino, Toshiro Wakabayashi, Hidenobu |
著者名の別形: | 若林, 英信 |
キーワード: | Hemispherical reflectance Normal emittance Real surface Simultaneous measurement Spectroscopic measurement Thermal radiation |
発行日: | Dec-2010 |
出版者: | Springer Science+Business Media, LLC. |
誌名: | International Journal of Thermophysics |
巻: | 31 |
号: | 11-12 |
開始ページ: | 2283 |
終了ページ: | 2294 |
抄録: | A new spectrophotometer system is developed for the study of thermal radiation characteristics of real surfaces in thermal engineering environments. The system measures spectra of normal incidence hemispherical reflectance RNH and normal emittance EN in the near-ultraviolet through infrared region of wavelength of 0.30 μm to 11 μm simultaneously and repeatedly with a cycle time of 4 s. The system enables evaluation of the normal incidence absorptance AN in this wide spectral region. Transitions of spectra of specular-finished and rough-finished nickel surfaces in a high-temperature air-oxidation process are measured to demonstrate the performance of the system. Clear interference behaviors are found even in the spectra of hemispherical reflectance RNH and emittance EN of a rough-finished surface. |
著作権等: | The final publication is available at www.springerlink.com This is not the published version. Please cite only the published version. この論文は出版社版でありません。引用の際には出版社版をご確認ご利用ください。 |
URI: | http://hdl.handle.net/2433/137217 |
DOI(出版社版): | 10.1007/s10765-010-0849-y |
出現コレクション: | 学術雑誌掲載論文等 |
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