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Title: | Embedded Microstructure Fabrication Using Developer-Permeability of Semi-Cross-Linked Negative Resist |
Authors: | Hirai, Yoshikazu ![]() ![]() ![]() Sugano, Koji Tsuchiya, Toshiyuki ![]() ![]() ![]() Tabata, Osamu ![]() |
Keywords: | Chemically amplified resist cross-linking reaction embedded microchannels microfluidics microelectromechanical systems (MEMS) photoresist polymer microstructures three-dimensional microfabrication UV lithography |
Issue Date: | 2010 |
Publisher: | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC |
Journal title: | JOURNAL OF MICROELECTROMECHANICAL SYSTEMS |
Volume: | 19 |
Issue: | 5 |
Start page: | 1058 |
End page: | 1069 |
URI: | http://hdl.handle.net/2433/146623 |
DOI(Published Version): | 10.1109/JMEMS.2010.2067202 |
Link: | Web of Science |
Appears in Collections: | Graduate School of Engineering Literature Database |

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