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Title: Embedded Microstructure Fabrication Using Developer-Permeability of Semi-Cross-Linked Negative Resist
Authors: Hirai, Yoshikazu  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0003-0835-7314 (unconfirmed)
Sugano, Koji
Tsuchiya, Toshiyuki  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0002-7846-5831 (unconfirmed)
Tabata, Osamu  KAKEN_id
Keywords: Chemically amplified resist
cross-linking reaction
embedded microchannels
microfluidics
microelectromechanical systems (MEMS)
photoresist
polymer microstructures
three-dimensional microfabrication
UV lithography
Issue Date: 2010
Publisher: IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Journal title: JOURNAL OF MICROELECTROMECHANICAL SYSTEMS
Volume: 19
Issue: 5
Start page: 1058
End page: 1069
URI: http://hdl.handle.net/2433/146623
DOI(Published Version): 10.1109/JMEMS.2010.2067202
Link: Web of Science
Appears in Collections:Graduate School of Engineering Literature Database

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