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Title: | A three-dimensional microstructuring technique exploiting the positive photoresist property |
Authors: | Hirai, Yoshikazu ![]() ![]() ![]() Sugano, Koji Tsuchiya, Toshiyuki ![]() ![]() ![]() Tabata, Osamu ![]() |
Issue Date: | 2010 |
Publisher: | IOP PUBLISHING LTD |
Journal title: | JOURNAL OF MICROMECHANICS AND MICROENGINEERING |
Volume: | 20 |
Issue: | 6 |
Thesis number: | 65005 |
URI: | http://hdl.handle.net/2433/146624 |
DOI(Published Version): | 10.1088/0960-1317/20/6/065005 |
Link: | Web of Science |
Appears in Collections: | Graduate School of Engineering Literature Database |

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