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Title: Reduction of deep levels generated by ion implantation into n- and p-type 4H-SiC
Authors: Kawahara, Koutarou
Suda, Jun
Pensl, Gerhard
Kimoto, Tsunenobu  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0002-6649-2090 (unconfirmed)
Issue Date: 2010
Publisher: AMER INST PHYSICS
Journal title: JOURNAL OF APPLIED PHYSICS
Volume: 108
Issue: 3
Thesis number: 33706
URI: http://hdl.handle.net/2433/146887
DOI(Published Version): 10.1063/1.3456159
Link: Web of Science
Appears in Collections:Graduate School of Engineering Literature Database

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