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|Title:||Effect of Series Capacitance and Accumulated Charge on a Substrate in a Deposition Process with an Atmospheric-Pressure Plasma Jet|
|Authors:||Ito, Yosuke https://orcid.org/0000-0003-3245-3840 (unconfirmed)|
|Publisher:||JAPAN SOC APPLIED PHYSICS|
|Journal title:||JAPANESE JOURNAL OF APPLIED PHYSICS|
|Link:||Web of Science|
|Appears in Collections:||Graduate School of Engineering Literature Database|
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