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Title: Effect of Series Capacitance and Accumulated Charge on a Substrate in a Deposition Process with an Atmospheric-Pressure Plasma Jet
Authors: Ito, Yosuke  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0003-3245-3840 (unconfirmed)
Fukui, Yutaka
Urabe, Keiichiro
Sakai, Osamu
Tachibana, Kunihide
Issue Date: 2010
Publisher: JAPAN SOC APPLIED PHYSICS
Journal title: JAPANESE JOURNAL OF APPLIED PHYSICS
Volume: 49
Issue: 6
Thesis number: 66201
URI: http://hdl.handle.net/2433/147038
DOI(Published Version): 10.1143/JJAP.49.066201
Link: Web of Science
Appears in Collections:Graduate School of Engineering Literature Database

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