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タイトル: | Contrast matching of an Si substrate with polymer films by anomalous dispersion at the Si |
著者: | Okuda, Hiroshi ![]() ![]() ![]() Takeshita, Kohki Ochiai, Shojiro ![]() Kitajima, Yoshinori Sakurai, Shinichi Ogawa, Hiroki ![]() ![]() |
著者名の別形: | 奥田, 浩司 |
キーワード: | grazing-incidence small-angle X-ray scattering anomalous scattering block copolymers soft X-rays |
発行日: | Feb-2012 |
出版者: | International Union of Crystallography |
誌名: | Journal of Applied Crystallography |
巻: | 45 |
号: | 1 |
開始ページ: | 119 |
終了ページ: | 121 |
抄録: | Anomalous dispersion at the Si K absorption edge has been used to control the reflection from the interface between a film and an Si substrate, which otherwise complicates the nanostructure analysis of such a film, particularly for the soft-matter case, in grazing-incidence small-angle scattering. Such a reflectionless condition has been chosen for a triblock copolymer thin film, and two-dimensional grazing-incidence small-angle scattering patterns were obtained without the effect of the reflection. The present approach is useful for analysing nanostructures without introducing complicated corrections arising from the reflection. |
著作権等: | © 2012 International Union of Crystallography |
URI: | http://hdl.handle.net/2433/153285 |
DOI(出版社版): | 10.1107/S002188981105206X |
出現コレクション: | 学術雑誌掲載論文等 |

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