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Title: Low-damage milling of an amino acid thin film with cluster ion beam
Authors: Hada, Masaki
Ibuki, Sachi
Hontani, Yusaku
Yamamoto, Yasuyuki
Ichiki, Kazuya
Ninomiya, Satoshi
Seki, Toshio  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0002-0834-1657 (unconfirmed)
Aoki, Takaaki  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0002-5926-4903 (unconfirmed)
Matsuo, Jiro  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0003-0684-3677 (unconfirmed)
Keywords: argon
etching
ion beam applications
ion beam effects
milling
organic compounds
positive ions
surface structure
thin films
X-ray photoelectron spectra
Issue Date: Nov-2011
Publisher: American Institute of Physics
Journal title: JOURNAL OF APPLIED PHYSICS
Volume: 110
Issue: 9
Thesis number: 094701
Abstract: In this work, we characterized the surface damage layer and sputtering yield of polycrystalline L-leucine films before and after irradiation with Ar cluster or monomer ion beams with x ray photoelectron spectroscopy and ellipsometry. Irradiation with Ar monomer ion beams induced heavy damage on the surface of L-leucine films, such as bond breaking and carbonization. In contrast, no significant surface damage was observed in the films irradiated with Ar cluster ion beams. The sputtering yield of L-leucine decreased dramatically with increasing fluence of monomer Ar ions and approached the value of the sputtering yield of graphite; but under irradiation with Ar cluster ion beams, the sputtering yield remained constant with fluence. The differences in sputtering yield behavior were explained in relation with the surface damage layer on organic materials. Thus, cluster ion beams could potentially be used to mill down biological materials without significant damage on the surface and could contribute to various applications in the analysis and processing of life matter.
Rights: Copyright 2011 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in JOURNAL OF APPLIED PHYSICS 110, 094701 (2011) and may be found at http://link.aip.org/link/?jap/110/094701
URI: http://hdl.handle.net/2433/160646
DOI(Published Version): 10.1063/1.3658220
Related Link: http://link.aip.org/link/?jap/110/094701
Appears in Collections:Journal Articles

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