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ファイル | 記述 | サイズ | フォーマット | |
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2010ja015600.pdf | 1.07 MB | Adobe PDF | 見る/開く |
タイトル: | Effects of the guard electrode on the photoelectron distribution around an electric field sensor |
著者: | Miyake, Y. Usui, H. Kojima, H. |
キーワード: | electric field sensors photoelectrons guard electrode plasma simulation charging instruments and techniques |
発行日: | May-2011 |
出版者: | AMER GEOPHYSICAL UNION |
誌名: | JOURNAL OF GEOPHYSICAL RESEARCH-SPACE PHYSICS |
巻: | 116 |
号: | A5 |
論文番号: | A05211 |
抄録: | We have developed a numerical model of a double-probe electric field sensor equipped with a photoelectron guard electrode for the particle-in-cell simulation. The model includes typical elements of modern double-probe sensors on, e.g., BepiColombo/MMO, Cluster, and THEMIS spacecraft, such as a conducting boom and a preamplifier housing called a puck. The puck is also used for the guard electrode, and its potential is negatively biased by reference to the floating spacecraft potential. We apply the proposed model to an analysis of an equilibrium plasma environment around the sensor by assuming that the sun illuminates the spacecraft from the direction perpendicular to the sensor deployment axis. As a simulation result, it is confirmed that a substantial number of spacecraft-originating photoelectrons are once emitted sunward and then fall onto the puck and sensing element positions. In order to effectively repel such photoelectrons coming from the sun direction, a potential hump for electrons, i.e., a negative potential region, should be created in a plasma region around the sunlit side of the guard electrode surface. The simulation results reveal the significance of the guard electrode potential being not only lower than the spacecraft body but also lower than the background plasma potential of the region surrounding the puck and the sensing element. One solution for realizing such an operational condition is to bias the guard potential negatively by reference to the sensor potential because the sensor is usually operated nearly at the background plasma potential. |
著作権等: | ©2011. American Geophysical Union. |
URI: | http://hdl.handle.net/2433/163425 |
DOI(出版社版): | 10.1029/2010ja015600 |
出現コレクション: | 学術雑誌掲載論文等 |

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