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Title: Photochemical grafting of methyl groups on a Si(111) surface using a Grignard reagent.
Authors: Herrera, Marvin Ustaris
Ichii, Takashi  kyouindb  KAKEN_id
Murase, Kuniaki  kyouindb  KAKEN_id  orcid (unconfirmed)
Sugimura, Hiroyuki  kyouindb  KAKEN_id
Author's alias: 杉村, 博之
Keywords: Methyl-terminated Si
Photochemical grafting
Grignard reagent
Self-assembled monolayer
Issue Date: 1-Dec-2013
Publisher: Elsevier Inc.
Journal title: Journal of colloid and interface science
Volume: 411
Start page: 145
End page: 151
Abstract: The photochemical grafting of methyl groups onto an n-type Si(111) substrate was successfully achieved using a Grignard reagent. The preparation involved illuminating a hydrogen-terminated Si(111) that was immersed in a CH3MgBr-THF solution. The success was attributed to the ability of the n-type hydrogenated substrate to produce holes on its surface when illuminated. The rate of grafting methyl groups onto the silicon surface was higher when a larger illumination intensity or when a substrate with lower dopant concentration was used. In addition, the methylated layer has an atomically flat structure, has a hydrophobic surface, and has electron affinity that was lower than the bulk Si.
Rights: © 2013 Elsevier Inc.
この論文は出版社版でありません。引用の際には出版社版をご確認ご利用ください。This is not the published version. Please cite only the published version.
DOI(Published Version): 10.1016/j.jcis.2013.08.035
PubMed ID: 24041547
Appears in Collections:Journal Articles

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