Access count of this item: 151
|Title:||Photochemical grafting of methyl groups on a Si(111) surface using a Grignard reagent.|
|Authors:||Herrera, Marvin Ustaris|
Murase, Kuniaki https://orcid.org/0000-0002-7564-9416 (unconfirmed)
|Author's alias:||杉村, 博之|
|Journal title:||Journal of colloid and interface science|
|Abstract:||The photochemical grafting of methyl groups onto an n-type Si(111) substrate was successfully achieved using a Grignard reagent. The preparation involved illuminating a hydrogen-terminated Si(111) that was immersed in a CH3MgBr-THF solution. The success was attributed to the ability of the n-type hydrogenated substrate to produce holes on its surface when illuminated. The rate of grafting methyl groups onto the silicon surface was higher when a larger illumination intensity or when a substrate with lower dopant concentration was used. In addition, the methylated layer has an atomically flat structure, has a hydrophobic surface, and has electron affinity that was lower than the bulk Si.|
|Rights:||© 2013 Elsevier Inc.|
この論文は出版社版でありません。引用の際には出版社版をご確認ご利用ください。This is not the published version. Please cite only the published version.
|Appears in Collections:||Journal Articles|
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