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タイトル: | Relationship between Local Structure and Oxide Ionic Diffusion of Nd[2]NiO[4+δ] with K[2]NiF[4] Structure |
著者: | INA, Toshiaki ORIKASA, Yuki MASESE, Titus NAKAO, Takayuki MINESHIGE, Atsushi AMEZAWA, Koji TANIDA, Hajime URUGA, Tomoya UCHIMOTO, Yoshiharu https://orcid.org/0000-0002-1491-2647 (unconfirmed) |
著者名の別形: | 折笠, 有基 |
キーワード: | Oxide Ion Conduction Nd[2]NiO[4] Local Structure Extended X-ray Absorption Fine Structure |
発行日: | Oct-2014 |
出版者: | Electrochemical Society of Japan |
誌名: | Electrochemistry |
巻: | 82 |
号: | 10 |
開始ページ: | 875 |
終了ページ: | 879 |
抄録: | The relationship between the local structure and oxide ionic conduction of Nd[2]NiO[4+δ]possessing the K[2]NiF[4] structure was investigated. Various oxygen nonstoichiometry samples of Nd[2]NiO[4+δ] prepared with different annealing oxygen partial pressures were examined. The local structure related to oxide ionic conduction was determined by the Nd K-edge extended X-ray absorption fine structure. The oxide ionic conductivity and surface exchange coefficient were estimated using electronic conductivity relaxation methods. The activation energy for the oxide ionic conductivity was found to have a direct correlation to the surface exchange coefficient. The bottleneck size for oxide ion conduction was strongly correlated to the oxide ionic conduction of interstitial oxygen and the oxygen surface exchange rate. |
著作権等: | © 2014 The Electrochemical Society of Japan この論文は出版社版でありません。引用の際には出版社版をご確認ご利用ください。 This is not the published version. Please cite only the published version. |
URI: | http://hdl.handle.net/2433/191121 |
DOI(出版社版): | 10.5796/electrochemistry.82.875 |
出現コレクション: | 学術雑誌掲載論文等 |
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