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Title: Investigation of molecular diffusivity of photoresist membrane using coarse-grained molecular dynamics simulation
Authors: Yagyu, Hiromasa
Hirai, Yoshikazu  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0003-0835-7314 (unconfirmed)
Makino, Yoshihide
Sugano, Koji
Tsuchiya, Toshiyuki  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0002-7846-5831 (unconfirmed)
Tabata, Osamu  kyouindb  KAKEN_id
Keywords: Photoresist
Molecules permeability
Molecular dynamics simulation
Membrane
Issue Date: 2012
Publisher: Elsevier Ltd.
Journal title: Procedia Engineering
Volume: 47
Start page: 402
End page: 405
Abstract: Biocompatible permeable membranes integrated with a microfluidic system, which allow the diffusion of biological molecules with certain molecular weight, are desirable in biomedical applications. This paper reports on a molecular level study of the molecules permeability of epoxy-based chemically-amplified photoresists in MEMS by employing a coarse-grained molecular dynamics simulation. For analyzing diffusion coefficient of molecular in photoresists, Kremer-Grest model (bead-spring model) with an extended angle bending potential was employed. The simulation results show that, with increasing the cross-linked ratio of photoresists, the diffusion coefficient of small molecules in photoresist have larger diffusion coefficient, and which suggests photoresist membrane can be used as permeable membranes with controllable permeability by varying photolithography parameters.
Description: 26th European Conference on Solid-State Transducers, EUROSENSOR 2012
Rights: This article is Under a Creative Commons license
© 2012 The Authors. Published by Elsevier Ltd. Selection and/or peer-review under responsibility of the Symposium Cracoviense Sp. z.o.o.
URI: http://hdl.handle.net/2433/193944
DOI(Published Version): 10.1016/j.proeng.2012.09.168
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