|タイトル:||Analytical investigation of the feasibility of sacrificial microchannel sealing for Chip-Scale Atomic Magnetometers|
|出版者:||Springer Berlin Heidelberg|
|抄録:||An alkali metal vapor cell is a crucial component of the highly sensitive Chip Scale Atomic Magnetometers (CSAMs) that are increasingly deployed in a variety of electronic devices. Herein, we propose a novel microfabrication technique utilizing an array of microchannels at a bonded interface, to enable gas feedthrough for evacuation of unwanted gases from a vapor cell and subsequent introduction of an inert gas, followed by permanent sealing of the microchannels by reflow of a glass frit. The characteristics of glass frit reflow are analyzed to investigate the feasibility of using microchannels formed either on a silicon substrate, or embedded in a glass frit layer, with four different cross-sectional shapes considered. Prior to modeling the microchannels for simulation, the minimum cross-sectional size of a microchannel that fulfills gas feedthrough requirements was calculated and a value of 10 μm was determined based on a flow conductance model. The sealing of the microchannels was simulated using the finite element method (FEM) and the results revealed that flow resistance is a crucial design factor. Thus, embedded microchannel designs were more suitable for the proposed sealing technique than microchannel designs fabricated in silicon.|
|著作権等:||The final publication is available at Springer via http://dx.doi.org/10.1007/s00542-013-1895-8.|
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