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dc.contributor.author | Smirnov, José Raúl Castro | en |
dc.contributor.author | Ito, Masateru | en |
dc.contributor.author | Calvo, Mauricio Ernesto | en |
dc.contributor.author | López-López, Carmen | en |
dc.contributor.author | Jiménez-Solano, Alberto | en |
dc.contributor.author | Galisteo-López, Juan Francisco | en |
dc.contributor.author | Zavala-Rivera, Paul | en |
dc.contributor.author | Tanaka, Koichiro | en |
dc.contributor.author | Sivaniah, Easan | en |
dc.contributor.author | Míguez, Hernán | en |
dc.contributor.alternative | 田中, 耕一郎 | ja |
dc.contributor.alternative | 伊藤, 真陽 | ja |
dc.date.accessioned | 2017-02-28T03:05:18Z | - |
dc.date.available | 2017-02-28T03:05:18Z | - |
dc.date.issued | 2015-11-01 | - |
dc.identifier.issn | 2195-1071 | - |
dc.identifier.uri | http://hdl.handle.net/2433/218467 | - |
dc.description.abstract | A synthetic route is demonstrated to build purely polymeric nanostructured multilayer coatings, adaptable to arbitrary surfaces, and capable of efficiently blocking by reflection a targeted and tunable ultraviolet (UV) range. Reflection properties are determined by optical interference between UV light beams reflected at the interfaces between polystyrene layers of different porosity and hence refractive index. As no dopant absorber intervenes in the shielding effect, polymer degradation effects are prevented. Alternated porosity results from the modulation of photochemical effects at the few tens of nanometers length scale, combined with the collective osmotic shock induced during the processing of the precursor diblock copolymer film. Experimental evidence of the application of this method to coat rough surfaces with smooth and conformal UV protecting films is provided. | en |
dc.format.mimetype | application/pdf | - |
dc.language.iso | eng | - |
dc.publisher | Wiley-VCH Verlag | en |
dc.rights | © 2015 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. This is an open access article under the terms of the Creative Commons Attribution-NonCommercial License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited and is not used for commercial purposes. | en |
dc.subject | Block copolymers | en |
dc.subject | Collective osmotic shock | en |
dc.subject | Photonic crystals | en |
dc.subject | Porous multilayers | en |
dc.subject | UV lithography | en |
dc.title | Adaptable Ultraviolet Reflecting Polymeric Multilayer Coatings of High Refractive Index Contrast | en |
dc.type | journal article | - |
dc.type.niitype | Journal Article | - |
dc.identifier.jtitle | Advanced Optical Materials | en |
dc.identifier.volume | 3 | - |
dc.identifier.spage | 1633 | - |
dc.identifier.epage | 1639 | - |
dc.relation.doi | 10.1002/adom.201500209 | - |
dc.textversion | publisher | - |
dc.address | Institute for Integrated Cell-Material Science, Kyoto University | en |
dc.address.alternative | 京都大学 物質-細胞統合システム拠点(iCeMS) | ja |
dcterms.accessRights | open access | - |
出現コレクション: | 学術雑誌掲載論文等 |
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