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タイトル: | Electrodeposition of Aluminum–Tungsten Alloy Films Using EMIC-AlCl₃-W₆Cl₁₂ Ionic Liquids of Different Compositions |
著者: | Higashino, Shota Miyake, Masao ![]() ![]() ![]() Fujii, Hisashi Takahashi, Ayumu Kasada, Ryuta Hirato, Tetsuji ![]() ![]() |
著者名の別形: | 東野, 昭太 三宅, 正男 藤井, 久史 高橋, 歩 笠田, 竜太 平藤, 哲司 |
キーワード: | electroplating aluminum alloy tungsten ionic liquid nano-indentation |
発行日: | 1-Jun-2018 |
出版者: | Japan Institute of Metals and Materials |
誌名: | Materials Transactions |
巻: | 59 |
号: | 6 |
開始ページ: | 944 |
終了ページ: | 949 |
抄録: | Electrodeposition of Al–W alloy films with high W contents has been carried out using 1-ethyl-3-methylimidazolium chloride (EMIC)–aluminum chloride (AlCl₃) ionic liquids containing tungsten(II) chloride (W₆Cl₁₂). Although the corrosion resistance and hardness of the alloy films are expected to be improved with an increase in the W content, dense films with W contents higher than ∼12 at% have not been obtained by electrodeposition to date. This study has demonstrated that electrodeposition using a EMIC-AlCl₃-W₆Cl₁₂ bath with a lower AlCl₃/EMIC molar ratio can yield Al–W alloys with higher W contents. The maximum W content of the alloys electrodeposited using the EMIC–1.5AlCl₃ bath reached 19.4 at%. The alloy films with up to ∼18 at% W were dense and smooth, whereas those with >∼18 at% W exhibited increased surface roughness. The hardness and Young’s modulus of the dense and smooth 17.7 at% W film were determined by nano-indentation. The hardness of this film was confirmed to be higher than those of the Al–W alloy films previously obtained from the EMIC–2AlCl₃ baths. |
著作権等: | © 2018 The Japan Institute of Metals and Materials Publisher permitted to deposit this paper on this repository. 発行元の許可を得て登録しています. |
URI: | http://hdl.handle.net/2433/237645 |
DOI(出版社版): | 10.2320/matertrans.M2018051 |
出現コレクション: | 学術雑誌掲載論文等 |

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