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タイトル: Electrodeposition of Aluminum–Tungsten Alloy Films Using EMIC-AlCl₃-W₆Cl₁₂ Ionic Liquids of Different Compositions
著者: Higashino, Shota
Miyake, Masao  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0001-8208-4030 (unconfirmed)
Fujii, Hisashi
Takahashi, Ayumu
Kasada, Ryuta
Hirato, Tetsuji  KAKEN_id  orcid https://orcid.org/0000-0003-3030-1632 (unconfirmed)
著者名の別形: 東野, 昭太
三宅, 正男
藤井, 久史
高橋, 歩
笠田, 竜太
平藤, 哲司
キーワード: electroplating
aluminum alloy
tungsten
ionic liquid
nano-indentation
発行日: 1-Jun-2018
出版者: Japan Institute of Metals and Materials
誌名: Materials Transactions
巻: 59
号: 6
開始ページ: 944
終了ページ: 949
抄録: Electrodeposition of Al–W alloy films with high W contents has been carried out using 1-ethyl-3-methylimidazolium chloride (EMIC)–aluminum chloride (AlCl₃) ionic liquids containing tungsten(II) chloride (W₆Cl₁₂). Although the corrosion resistance and hardness of the alloy films are expected to be improved with an increase in the W content, dense films with W contents higher than ∼12 at% have not been obtained by electrodeposition to date. This study has demonstrated that electrodeposition using a EMIC-AlCl₃-W₆Cl₁₂ bath with a lower AlCl₃/EMIC molar ratio can yield Al–W alloys with higher W contents. The maximum W content of the alloys electrodeposited using the EMIC–1.5AlCl₃ bath reached 19.4 at%. The alloy films with up to ∼18 at% W were dense and smooth, whereas those with >∼18 at% W exhibited increased surface roughness. The hardness and Young’s modulus of the dense and smooth 17.7 at% W film were determined by nano-indentation. The hardness of this film was confirmed to be higher than those of the Al–W alloy films previously obtained from the EMIC–2AlCl₃ baths.
著作権等: © 2018 The Japan Institute of Metals and Materials
Publisher permitted to deposit this paper on this repository. 発行元の許可を得て登録しています.
URI: http://hdl.handle.net/2433/237645
DOI(出版社版): 10.2320/matertrans.M2018051
出現コレクション:学術雑誌掲載論文等

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