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| ファイル | 記述 | サイズ | フォーマット | |
|---|---|---|---|---|
| 2.1291914jes.pdf | 2.12 MB | Adobe PDF | 見る/開く |
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| DCフィールド | 値 | 言語 |
|---|---|---|
| dc.contributor.author | Norikawa, Yutaro | en |
| dc.contributor.author | Yasuda, Kouji | en |
| dc.contributor.author | Nohira, Toshiyuki | en |
| dc.contributor.alternative | 法川, 勇太郎 | ja |
| dc.contributor.alternative | 安田, 幸司 | ja |
| dc.contributor.alternative | 野平, 俊之 | ja |
| dc.date.accessioned | 2019-11-11T07:35:43Z | - |
| dc.date.available | 2019-11-11T07:35:43Z | - |
| dc.date.issued | 2019 | - |
| dc.identifier.issn | 0013-4651 | - |
| dc.identifier.issn | 1945-7111 | - |
| dc.identifier.uri | http://hdl.handle.net/2433/244715 | - |
| dc.description.abstract | Optimized conditions for Ti film electrodeposition were investigated in water-soluble KF–KCl (45:55 mol%) molten salt at 923 K. K₃TiF₆ was prepared in the melt via a comproportionation reaction between K₂TiF₆ and Ti sponges. The K₃TiF₆ solubility was determined to be 1.48 mol%. Galvanostatic electrolysis was conducted on Ni plate substrates at various K₃TiF₆ concentrations (0.28, 0.70, and 1.43 mol%) and current densities (25–150 mA cm⁻²). Surface and cross-sectional scanning electron microscopy observations showed that adherent, compact, and smooth Ti films were obtained at higher K₃TiF₆ concentrations and lower current densities. A corrosion test was conducted for the Ti-coated Ni plate using linear sweep voltammetry, which showed that the Ti films have no cracks or voids. | en |
| dc.format.mimetype | application/pdf | - |
| dc.language.iso | eng | - |
| dc.publisher | Electrochemical Society Inc. | en |
| dc.rights | © The Author(s) 2019. Published by ECS. This is an open access article distributed under the terms of the Creative Commons Attribution Non-Commercial No Derivatives 4.0 License (CC BY-NC-ND, http://creativecommons.org/licenses/by-nc-nd/4.0/), which permits non-commercial reuse, distribution, and reproduction in any medium, provided the original work is not changed in any way and is properly cited. For permission for commercial reuse, please email: oa@electrochem.org. | en |
| dc.subject | Electrodeposition | en |
| dc.subject | Molten Salts - High temperature molten salts | en |
| dc.subject | Electrodeposition | en |
| dc.subject | Molten salt | en |
| dc.subject | Titanium | en |
| dc.title | Optimization of electrolysis conditions for Ti film electrodeposition from water-soluble KF–KCl molten salts | en |
| dc.type | journal article | - |
| dc.type.niitype | Journal Article | - |
| dc.identifier.jtitle | Journal of the Electrochemical Society | en |
| dc.identifier.volume | 166 | - |
| dc.identifier.issue | 14 | - |
| dc.identifier.spage | D755 | - |
| dc.identifier.epage | D759 | - |
| dc.relation.doi | 10.1149/2.1291914jes | - |
| dc.textversion | publisher | - |
| dc.address | Institute of Advanced Energy, Kyoto University | en |
| dc.address | Agency for Health, Safety and Environment, Kyoto University･Graduate School of Energy Science, Kyoto University | en |
| dc.address | Institute of Advanced Energy, Kyoto University | en |
| dcterms.accessRights | open access | - |
| 出現コレクション: | 学術雑誌掲載論文等 | |
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