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タイトル: Stability of a phosphonic acid monolayer on aluminum in liquid environments
著者: Hiwasa, Noboru
Utsunomiya, Toru  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0002-0023-7812 (unconfirmed)
Ichii, Takashi  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0002-4021-8894 (unconfirmed)
Sugimura, Hiroyuki  KAKEN_id
著者名の別形: 宇都宮, 徹
一井, 崇
杉村, 博之
発行日: 1-Mar-2020
出版者: Institute of Physics Publishing
誌名: Japanese Journal of Applied Physics
巻: 59
号: SD
論文番号: SDDA08
抄録: The stability of phosphonic acid self-assembled monolayers (SAMs) in water was studied on aluminum surfaces. The aim was to understand the stability of SAMs under the practical conditions that are relevant to various applications. After exposing the as-prepared alkyl- and fluoroalkyl-SAM surfaces to water at 40 °C for 2 h, the contact angle decreased from more than 100° to less than 20°. Thermally annealed SAMs showed larger water contact angles after exposing to water, indicating that the desorption of the molecules was depressed.
著作権等: © 2019 The Japan Society of Applied Physics.
This is an author-created, un-copyedited version of an article accepted for publication in 'Japanese Journal of Applied Physics'. The publisher is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at https://doi.org/10.7567/1347-4065/ab4ec1
The full-text file will be made open to the public on 10 December 2020 in accordance with publisher's 'Terms and Conditions for Self-Archiving'.
この論文は出版社版でありません。引用の際には出版社版をご確認ご利用ください。
This is not the published version. Please cite only the published version.
URI: http://hdl.handle.net/2433/250519
DOI(出版社版): 10.7567/1347-4065/ab4ec1
出現コレクション:学術雑誌掲載論文等

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