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j.jallcom.2020.154567.pdf | 901.15 kB | Adobe PDF | 見る/開く |
タイトル: | Fabrication and mechanical properties of tungsten carbide thin films via mist chemical vapor deposition |
著者: | Ikenoue, Takumi https://orcid.org/0000-0002-3753-6453 (unconfirmed) Yoshida, Takuji Miyake, Masao https://orcid.org/0000-0001-8208-4030 (unconfirmed) Kasada, Ryuta Hirato, Tetsuji https://orcid.org/0000-0003-3030-1632 (unconfirmed) |
著者名の別形: | 池之上, 卓己 三宅, 正男 平藤, 哲司 |
キーワード: | Coating materials Thin films Mechanical properties |
発行日: | 5-Jul-2020 |
出版者: | Elsevier BV |
誌名: | Journal of Alloys and Compounds |
巻: | 829 |
論文番号: | 154567 |
抄録: | Tungsten carbide thin films are used as wear-resistant coatings. For such applications, it is industrially advantageous to form high-quality thin films on substrates with large areas or complex shapes under atmospheric pressure. Herein, we investigated the feasibility of forming tungsten carbide thin films using a mist chemical vapor deposition method. WC1-x thin films with smooth surfaces were obtained at growth temperatures of 650 °C or above, and the elemental composition ratios of C/W and N/W gradually approached 1 and 0, respectively, with increasing growth temperature. The hardness and Young's modulus of the film obtained at 750 °C were 25 GPa and 409 GPa, respectively. The grown WC1-x films have potential for use as hard coatings. |
著作権等: | © 2020. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/. The full-text file will be made open to the public on 15 July 2022 in accordance with publisher's 'Terms and Conditions for Self-Archiving'. この論文は出版社版でありません。引用の際には出版社版をご確認ご利用ください。 This is not the published version. Please cite only the published version. |
URI: | http://hdl.handle.net/2433/252432 |
DOI(出版社版): | 10.1016/j.jallcom.2020.154567 |
出現コレクション: | 学術雑誌掲載論文等 |
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