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ファイル | 記述 | サイズ | フォーマット | |
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j.elecom.2021.107139.pdf | 3.49 MB | Adobe PDF | 見る/開く |
タイトル: | Electrodeposition of mirror surface β-W films in molten CsF–CsCl–WO₃ |
著者: | Meng, Xianduo Norikawa, Yutaro ![]() ![]() ![]() Nohira, Toshiyuki ![]() ![]() ![]() |
著者名の別形: | 法川, 勇太郎 野平, 俊之 |
キーワード: | Tungsten films β-Tungsten Electrodeposition Molten salt CsF–CsCl |
発行日: | Nov-2021 |
出版者: | Elsevier BV |
誌名: | Electrochemistry Communications |
巻: | 132 |
論文番号: | 107139 |
抄録: | In this study we report, for the first time, a thick β-W film with a mirror-like surface prepared through electrodeposition involving a CsF–CsCl eutectic melt combined with 2.0 mol% of WO₃ at 773 K. A smooth-surfaced β-W film with a thickness of 13 µm was obtained when galvanostatic electrolysis was performed at − 4 mA cm⁻². X-ray diffraction analysis revealed that the obtained β-W films have a strong preferred orientation along the {1 1 1} plane, which becomes stronger with decreasing current density. Surface and cross-sectional morphologies observed through scanning electron microscopy indicated that increasing the current density caused the growth of the electrodeposit to change from the field-oriented texture type to the unoriented dispersion type, in accordance with Fischer’s classification of electrodeposition. To the best of our knowledge, this is the first time that mirror-like metal films have been electrodeposited in a high temperature molten salt, not only for tungsten but for any metal. |
著作権等: | © 2021 The Author(s). Published by Elsevier B.V. This is an open access article under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International license. |
URI: | http://hdl.handle.net/2433/274213 |
DOI(出版社版): | 10.1016/j.elecom.2021.107139 |
出現コレクション: | 学術雑誌掲載論文等 |

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