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タイトル: Fabrication of Detonation Nanodiamonds Containing Silicon‐Vacancy Color Centers by High Temperature Annealing
著者: Shimazaki, Konosuke
Kawaguchi, Hiroki
Takashima, Hideaki
Segawa, Takuya Fabian
So, Frederick T.-K.
Terada, Daiki
Onoda, Shinobu
Ohshima, Takeshi
Shirakawa, Masahiro  kyouindb  KAKEN_id
Takeuchi, Shigeki  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0001-7731-003X (unconfirmed)
著者名の別形: 嶋崎, 幸之介
川口, 洋生
髙島, 秀聡
寺田, 大紀
白川, 昌宏
竹内, 繁樹
キーワード: detonation nanodiamonds
nanodiamonds
narrow emission lines
silicon-vacancy centers
発行日: Oct-2021
出版者: Wiley
誌名: physica status solidi (a)
巻: 218
号: 19
論文番号: 2100144
抄録: Detonation nanodiamonds (DNDs) with sizes below 10 nm have attracted attention as single photon emitters with potential in many research fields from life sciences to quantum technologies. However, while nitrogen-vacancy (NV) color centers are found in nanodiamonds directly after the detonation synthesis without the need for irradiation or annealing, silicon-vacancy (SiV) color centers are not present in these pristine samples. Herein, SiV centers are created in DNDs by an annealing treatment up to 1100 °C in high vacuum. As silicon is not added, the precursor of the SiV centers must be pristine silicon impurities inside the nanodiamond lattice. A sharp emission line at the wavelength of 737 nm with a linewidth of 7.7 nm is observed in DNDs that are electron irradiated before annealing. This wavelength is consistent with the characteristic emission line of SiV centers and its linewidth is comparable with that in larger nanodiamonds created by chemical vapor deposition and subsequent milling. The average lifetime (0.4 ± 0.04 ns) of the fluorescence, which is in the range of reported lifetimes in nanodiamonds, also support that the observed emission peak are due to SiV centers in DNDs.
著作権等: © 2021 The Authors. physica status solidi (a) applications and materials science published by Wiley-VCH GmbH
This is an open access article under the terms of the Creative Commons Attribution-NonCommercial-NoDerivs License, which permits use and distribution in any medium, provided the original work is properly cited, the use is non-commercial and no modifications or adaptations are made.
URI: http://hdl.handle.net/2433/276819
DOI(出版社版): 10.1002/pssa.202100144
出現コレクション:学術雑誌掲載論文等

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