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タイトル: | Performance Boost by Dark Electro Treatment in MACl-Added FAPbI₃ Perovskite Solar Cells |
著者: | Pylnev, Mikhail Nishikubo, Ryosuke Ishiwari, Fumitaka Wakamiya, Atsushi ![]() ![]() ![]() Saeki, Akinori |
著者名の別形: | 若宮, 淳志 |
キーワード: | dark electro treatment formamidinium lead iodide perovskite light soaking methylammonium chloride passivation tree maturation |
発行日: | 20-Dec-2024 |
出版者: | Wiley |
誌名: | Advanced Optical Materials |
巻: | 12 |
号: | 36 |
論文番号: | 2401902 |
抄録: | Halide anion migration in organic–inorganic metal halide perovskites significantly influences the power conversion efficiency (PCE) and hysteresis of perovskite solar cells (PSCs). These materials are sensitive to various external stimuli such as light, heat, and electrical bias, highlighting the need for novel post-manufacturing treatment methods alongside a deeper understanding of their mechanisms. Here, a dark electro (DE) treatment is introduced that applies a negative-positive-negative bias to PSC under dark conditions, which is particularly effective for formamidinium (FA) lead iodide (FAPbI3) PSCs processed with a methylammonium chloride (MACl) additive. The DE treatment, followed by light soaking, results in an average PCE increase of 2.9 ± 1.8% (from an initial 18.2 ± 2.0% to 21.1 ± 0.8% after treatment) with a notable decrease in deviation. It is discovered that residual chloride anions from MACl play a critical role in the DE treatment. The migration of halide anions under a shaking electric bias is investigated using energy-dispersive X-ray spectroscopy (EDX) and time-of-flight secondary ion mass spectroscopy (TOF-SIMS). This study elucidates the distribution and impact of residual chloride anions, providing insights into the mechanisms underlying the DE treatment. |
著作権等: | © 2024 The Author(s). Advanced Optical Materials published by Wiley-VCH GmbH This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited. |
URI: | http://hdl.handle.net/2433/293183 |
DOI(出版社版): | 10.1002/adom.202401902 |
関連リンク: | https://onlinelibrary.wiley.com/doi/pdf/10.1002/adom.202401902 |
出現コレクション: | 学術雑誌掲載論文等 |

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