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Title: Rate-determining process in chemical vapor deposition of SiC on off-axis alpha-SiC (0001)
Authors: Nakamura, S
Kimoto, T  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0002-6649-2090 (unconfirmed)
Matsunami, H
Keywords: chemical vapor deposition processes
semiconducting silicon compounds
Issue Date: 2004
Publisher: ELSEVIER SCIENCE BV
Journal title: JOURNAL OF CRYSTAL GROWTH
Volume: 270
Issue: 3-4
Start page: 455
End page: 461
URI: http://hdl.handle.net/2433/6148
DOI(Published Version): 10.1016/j.jcrysgro.2004.06.049
Link: Web of Science
Appears in Collections:Graduate School of Engineering Literature Database

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