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タイトル: Controlled Graft Polymerization on Silicon Substrate by the Combined Use of the Langmuir-Blodgett and Atom Transfer Radical Polymerization Techniques (ORGANIC MATERIALS CHEMISTRY-Polymeric Materials)
著者: Ejaz, Muhammad
Yamamoto, Shinpei
Ohno, Kohji
Tsujii, Yoshinobu  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0002-4357-6902 (unconfirmed)
Fukuda, Takeshi
Miyamoto, Takeaki
キーワード: Surface modification
Monolayer
Immobilization
Controlled radical polymerization
Graft layer
Ellipsometry
発行日: Mar-1998
出版者: Institute for Chemical Research, Kyoto University
誌名: ICR Annual Report
巻: 4
開始ページ: 30
終了ページ: 31
抄録: The atom transfer radical polymerization technique using the copper/ligand complexes was applied to the graft polymerization of methyl methacrylate on the Si wafer on which the monolayer of the initiator, 2-(4-chlorosulfonylphenyl) ethyl trimethoxysilane, was immobilized by the Langmuir- Blodgett technique. Atomic force microscopic and ellipsometric studies revealed that the polymerization with an additional initiator afforded a homogeneous graft layer, the thickness of which increased proportionally to the number-average molecular weight of the narrow-polydispersity homopolymers produced in the solution. This suggests that the graft polymerization is successfully controlled by the Cu/ligand complexes in the same way as the solution polymerization.
URI: http://hdl.handle.net/2433/65153
出現コレクション:Vol.4 (1997)

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