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dc.contributor.authorEjaz, Muhammaden
dc.contributor.authorYamamoto, Shinpeien
dc.contributor.authorOhno, Kohjien
dc.contributor.authorTsujii, Yoshinobuen
dc.contributor.authorFukuda, Takeshien
dc.contributor.authorMiyamoto, Takeakien
dc.date.accessioned2008-08-25T06:06:31Z-
dc.date.available2008-08-25T06:06:31Z-
dc.date.issued1998-03-
dc.identifier.issn1342-0321-
dc.identifier.urihttp://hdl.handle.net/2433/65153-
dc.description.abstractThe atom transfer radical polymerization technique using the copper/ligand complexes was applied to the graft polymerization of methyl methacrylate on the Si wafer on which the monolayer of the initiator, 2-(4-chlorosulfonylphenyl) ethyl trimethoxysilane, was immobilized by the Langmuir- Blodgett technique. Atomic force microscopic and ellipsometric studies revealed that the polymerization with an additional initiator afforded a homogeneous graft layer, the thickness of which increased proportionally to the number-average molecular weight of the narrow-polydispersity homopolymers produced in the solution. This suggests that the graft polymerization is successfully controlled by the Cu/ligand complexes in the same way as the solution polymerization.en
dc.format.mimetypeapplication/pdf-
dc.language.isoeng-
dc.publisherInstitute for Chemical Research, Kyoto Universityen
dc.subjectSurface modificationen
dc.subjectMonolayeren
dc.subjectImmobilizationen
dc.subjectControlled radical polymerizationen
dc.subjectGraft layeren
dc.subjectEllipsometryen
dc.subject.ndc430-
dc.titleControlled Graft Polymerization on Silicon Substrate by the Combined Use of the Langmuir-Blodgett and Atom Transfer Radical Polymerization Techniques (ORGANIC MATERIALS CHEMISTRY-Polymeric Materials)en
dc.typearticle-
dc.type.niitypeArticle-
dc.identifier.ncidAA11061308-
dc.identifier.jtitleICR Annual Reporten
dc.identifier.volume4-
dc.identifier.spage30-
dc.identifier.epage31-
dc.textversionpublisher-
dc.sortkey17-
dcterms.accessRightsopen access-
dc.identifier.pissn1342-0321-
出現コレクション:Vol.4 (1997)

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