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| Title: | Effect of oxygen concentration on the spike formation during reactive ion etching of SiC using the mixed gas plasma of NF3 and O-2 |
| Authors: | Tasaka, A. Watanabe, E. Kai, T. Shimizu, W. Kanatani, T. Inaba, M. Tojo, T. Tanaka, M. Abe, T.    https://orcid.org/0000-0002-1515-8340 (unconfirmed)Ogumi, Z. |
| Issue Date: | 2007 |
| Publisher: | A V S AMER INST PHYSICS |
| Journal title: | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A |
| Volume: | 25 |
| Issue: | 2 |
| Start page: | 391 |
| End page: | 400 |
| URI: | http://hdl.handle.net/2433/67107 |
| DOI(Published Version): | 10.1116/1.2699473 |
| Link: | Web of Science |
| Appears in Collections: | Graduate School of Engineering Literature Database |
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