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| Title: | Plasma etching of SiC surface using NF3 |
| Authors: | Tasaka, A Takahashi, K Tanaka, K Shimizu, K Mori, K Tada, S Shimizu, W Abe, T    https://orcid.org/0000-0002-1515-8340 (unconfirmed)Inaba, M Ogumi, Z Tojo, T |
| Issue Date: | 2002 |
| Publisher: | A V S AMER INST PHYSICS |
| Journal title: | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS |
| Volume: | 20 |
| Issue: | 4 |
| Start page: | 1254 |
| End page: | 1260 |
| URI: | http://hdl.handle.net/2433/7825 |
| DOI(Published Version): | 10.1116/1.1481044 |
| Link: | Web of Science |
| Appears in Collections: | Graduate School of Engineering Literature Database |
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