Files in This Item:
There are no files associated with this item.
|Title:||High speed deposition of SiO2 films with plasma jet based on capillary dielectric barrier discharge at atmospheric pressure|
|Authors:||Ito, Yosuke https://orcid.org/0000-0003-3245-3840 (unconfirmed)|
|Publisher:||INST PURE APPLIED PHYSICS|
|Journal title:||APPLIED PHYSICS EXPRESS|
|Link:||Web of Science|
|Appears in Collections:||Graduate School of Engineering Literature Database|
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.