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Title: | Relationship between resistivity and structure of photosensitive organic silsesquioxanes by impedance Spectroscopy and solid-state 29 Si nuclear magnetic resonance |
Authors: | Kusaka, Yasunari Nakamura, Shigeru Azuma, Kenichi Sasaki, Taku Unate, Takao Nakatani, Yasuhiro Nakasuga, Akira Matsukawa, Kimihiro Watanabe, Naoki Naito, Hiroyoshi Kaji, Hironori https://orcid.org/0000-0002-5111-3852 (unconfirmed) |
Keywords: | photosensitive insulating materials silsesquioxane impedance spectroscopy solid-state NMR Si-29 NMR resistivity |
Issue Date: | 2008 |
Publisher: | INST PURE APPLIED PHYSICS |
Journal title: | JAPANESE JOURNAL OF APPLIED PHYSICS |
Volume: | 47 |
Issue: | 2(Part 2) |
Start page: | 1377 |
End page: | 1381 |
URI: | http://hdl.handle.net/2433/78950 |
DOI(Published Version): | 10.1143/JJAP.47.1377 |
Link: | Web of Science |
Appears in Collections: | Graduate School of Engineering Literature Database |
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