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Title: Relationship between resistivity and structure of photosensitive organic silsesquioxanes by impedance Spectroscopy and solid-state 29 Si nuclear magnetic resonance
Authors: Kusaka, Yasunari
Nakamura, Shigeru
Azuma, Kenichi
Sasaki, Taku
Unate, Takao
Nakatani, Yasuhiro
Nakasuga, Akira
Matsukawa, Kimihiro
Watanabe, Naoki
Naito, Hiroyoshi
Kaji, Hironori  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0002-5111-3852 (unconfirmed)
Keywords: photosensitive insulating materials
silsesquioxane
impedance spectroscopy
solid-state NMR
Si-29 NMR
resistivity
Issue Date: 2008
Publisher: INST PURE APPLIED PHYSICS
Journal title: JAPANESE JOURNAL OF APPLIED PHYSICS
Volume: 47
Issue: 2(Part 2)
Start page: 1377
End page: 1381
URI: http://hdl.handle.net/2433/78950
DOI(Published Version): 10.1143/JJAP.47.1377
Link: Web of Science
Appears in Collections:Graduate School of Engineering Literature Database

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