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dc.contributor.authorKusaka, Yasunarien
dc.contributor.authorNakamura, Shigeruen
dc.contributor.authorAzuma, Kenichien
dc.contributor.authorSasaki, Takuen
dc.contributor.authorUnate, Takaoen
dc.contributor.authorNakatani, Yasuhiroen
dc.contributor.authorNakasuga, Akiraen
dc.contributor.authorMatsukawa, Kimihiroen
dc.contributor.authorWatanabe, Naokien
dc.contributor.authorNaito, Hiroyoshien
dc.contributor.authorKaji, Hironorien
dc.date.accessioned2009-06-23T05:31:28Z-
dc.date.available2009-06-23T05:31:28Z-
dc.date.issued2008-
dc.identifier.issn0021-4922-
dc.identifier.urihttp://hdl.handle.net/2433/78950-
dc.language.isoeng-
dc.publisherINST PURE APPLIED PHYSICSen
dc.subjectphotosensitive insulating materialsen
dc.subjectsilsesquioxaneen
dc.subjectimpedance spectroscopyen
dc.subjectsolid-state NMRen
dc.subjectSi-29 NMRen
dc.subjectresistivityen
dc.titleRelationship between resistivity and structure of photosensitive organic silsesquioxanes by impedance Spectroscopy and solid-state 29 Si nuclear magnetic resonanceen
dc.typeconference paper-
dc.type.niitypeConference Paper-
dc.identifier.jtitleJAPANESE JOURNAL OF APPLIED PHYSICSen
dc.identifier.volume47-
dc.identifier.issue2(Part 2)-
dc.identifier.spage1377-
dc.identifier.epage1381-
dc.relation.doi10.1143/JJAP.47.1377-
dc.textversionnone-
dcterms.accessRightsmetadata only access-
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