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Title: Surface mechanisms in homoepitaxial growth on alpha-SiC {0001}-vicinal faces
Authors: Nakamura, S
Kimoto, T  kyouindb  KAKEN_id  orcid https://orcid.org/0000-0002-6649-2090 (unconfirmed)
Matsunami, H
Keywords: chemical vapor deposition (CVD)
homoepitaxial growth
{0001}-vicinal faces
atomic force-microscopy (AFM)
surface step structures
Issue Date: 2004
Publisher: TRANS TECH PUBLICATIONS LTD
Journal title: SILICON CARBIDE AND RELATED MATERIALS 2003, PTS 1 AND 2
Volume: 457-460
Start page: 163
End page: 168
URI: http://hdl.handle.net/2433/8830
Link: Web of Science
Appears in Collections:Graduate School of Engineering Literature Database

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