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書誌情報	ファイル
Film precursor formation in metalorganic chemical vapor deposition of barium strontium titanate films: A study by microdischarge optical emission spectroscopy Momose, S; Nakamura, T; Tachibana, K (2002) JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 41(2A): 778-783
Ab initio calculations of the dissociative attachment resonance energies for an octafluorocyclopentene molecule with comparisons to electron attachment mass spectrometric measurements Nakamura, T; Tachibana, K (2002) APPLIED PHYSICS LETTERS, 80(21): 3904-3906
Thermal decomposition mechanism of a titanium source, Ti-(MPD)-(METHD)(2), in MOCVD Nakamura, T; Nishimura, T; Tachibana, K (2004) JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 151(12): C806-C810
Reaction mechanism of a lanthanum precursor in liquid source metalorganic chemical vapor deposition Nakamura, T; Nishimura, T; Tai, R; Tachibana, K (2005) MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 118(1-3): 253-258
Ferromagnetism in sputtered manganese-doped indium tin oxide films with high conductivity and transparency Nakamura, T; Tanabe, K; Tsureishi, K; Tachibana, K (2007-05-01) JOURNAL OF APPLIED PHYSICS, 101(9)
Metalorganic chemical vapor deposition of magnetoresistive manganite films exhibiting electric-pulse-induced resistance change effect Nakamura, T; Tai, R; Tachibana, K (2006-04-15) JOURNAL OF APPLIED PHYSICS, 99(8)
Electric-pulse-induced resistance switching in magnetoresistive manganite films grown by metalorganic chemical vapor deposition Nakamura, T; Homma, K; Tai, R; Nishio, A; Tachibana, K (2007-06) IEEE TRANSACTIONS ON MAGNETICS, 43(6): 3070-3072
Composition control of manganite perovskites in metalorganic chemical vapor deposition with in situ spectroscopic monitoring Nakamura, T; Tai, R; Nishimura, T; Tachibana, K (2005-05-15) JOURNAL OF APPLIED PHYSICS, 97(10)
Ab initio calculations of the dissociative attachment resonance energies for an octafluorocyclopentene molecule with comparisons to electron attachment mass spectrometric measurements Nakamura, T; Tachibana, K (2002-05-27) APPLIED PHYSICS LETTERS, 80(21): 3904-3906
In situ infrared spectroscopic study on a titanium source in MOCVD Nakamura, T; Nishimura, T; Momose, S; Tachibana, K (2004) JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 151(10): C605-C609