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タイトル: | Intraspecific variation among Tetranychid mites for ability to detoxify and to induce plant defenses. |
著者: | Ozawa, Rika Endo, Hiroki Iijima, Mei Sugimoto, Koichi Takabayashi, Junji https://orcid.org/0000-0002-3575-9952 (unconfirmed) Gotoh, Tetsuo Arimura, Gen-ichiro |
著者名の別形: | 小澤, 理香 高林, 純示 |
発行日: | 2017 |
出版者: | Springer Nature |
誌名: | Scientific Reports |
巻: | 7 |
論文番号: | 43200 |
抄録: | Two genotypes coexist among Kanzawa spider mites, one of which causes red scars and the other of which causes white scars on leaves, and they elicit different defense responses in host plants. Based on RNA-Seq analysis, we revealed here that the expression levels of genes involved in the detoxification system were higher in Red strains than White strains. The corresponding enzyme activities as well as performances for acaricide resistance and host adaptation toward Laminaceae were also higher in Red strains than White strains, indicating that Red strains were superior in trait(s) of the detox system. In subsequent generations of strains that had survived exposure to fenpyroximate, both strains showed similar resistance to this acaricide, as well as similar detoxification activities. The endogenous levels of salicylic acid and jasmonic acid were increased similarly in bean leaves damaged by original Red strains and their subsequent generations that inherited high detox activity. Jasmonic acid levels were increased in leaves damaged by original White strains, but not by their subsequent generations that inherited high detox activity. Together, these data suggest the existence of intraspecific variation - at least within White strains - with respect to their capacity to withstand acaricides and host plant defenses. |
著作権等: | This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ |
URI: | http://hdl.handle.net/2433/218832 |
DOI(出版社版): | 10.1038/srep43200 |
PubMed ID: | 28240222 |
出現コレクション: | 学術雑誌掲載論文等 |
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