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書誌情報ファイル
Fluorine-doped tin dioxide thin films prepared by chemical vapor deposition
  MARUYAMA, T; TABATA, K (1990-10-15)
  JOURNAL OF APPLIED PHYSICS, 68(8): 4282-4285
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Fluorine-doped indium oxide thin films prepared by chemical vapor deposition
  MARUYAMA, T; NAKAI, T (1992-03-15)
  JOURNAL OF APPLIED PHYSICS, 71(6): 2915-2917
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Indium-tin oxide thin films prepared by chemical vapor deposition
  MARUYAMA, T; FUKUI, K (1991-10-01)
  JOURNAL OF APPLIED PHYSICS, 70(7): 3848-3851
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Photoluminescence of porous silicon exposed to ambient air
  MARUYAMA, T; OHTANI, S (1994-09-12)
  APPLIED PHYSICS LETTERS, 65(11): 1346-1348
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Silicon dioxide thin films prepared by chemical vapor deposition from tetrakis (dimethylamino)silane and ozone
  MARUYAMA, T; SHIRAI, T (1993-08-02)
  APPLIED PHYSICS LETTERS, 63(5): 611-613
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Aluminum oxide thin films prepared by chemical vapor deposition from aluminum 2-ethylhexanoate
  MARUYAMA, T; NAKAI, T (1991-05-13)
  APPLIED PHYSICS LETTERS, 58(19): 2079-2080
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Aluminum oxide thin films prepared by chemical vapor deposition from aluminum acetylacetonate
  MARUYAMA, T; ARAI, S (1992-01-20)
  APPLIED PHYSICS LETTERS, 60(3): 322-323
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Cobalt thin films prepared by chemical vapor deposition from cobaltous acetate
  MARUYAMA, T; NAKAI, T (1991-09-16)
  APPLIED PHYSICS LETTERS, 59(12): 1433-1434
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Analytic study on the intrinsic zeros of sampled-data systems
  Hagiwara, T (1996-02)
  IEEE Transactions on Automatic Control, 41(2): 261-263
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Micro-feeding of fine powders using a capillary tube with ultrasonic vibration
  Matsusaka, Shuji; Urakawa, Motohiro; Masuda, Hiroaki (1995)
  Advanced Powder Technology, 6(4): 283-293
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