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dc.contributor.authorEriguchi, Kojien
dc.contributor.authorWei, Zhiqiangen
dc.contributor.authorTakagi, Takeshien
dc.contributor.authorOno, Kouichien
dc.contributor.alternative江利口, 浩二ja
dc.date.accessioned2011-02-21T04:27:44Z-
dc.date.available2011-02-21T04:27:44Z-
dc.date.issued2010-01-
dc.identifier.issn0021-8979-
dc.identifier.urihttp://hdl.handle.net/2433/137215-
dc.description.abstractAn electrical stress-induced resistance change in an Fe–O film was studied in detail. Under constant voltage stress (CVS) and constant current injection, the resistance of the Fe–O film abruptly increased. The observed time-to-resistance increase (tr) was found to depend on the applied voltage as well as on the injected current density. The total input energy until tr also depended on the applied voltage. From these observations, the mechanisms of resistance change are considered to obey a field-enhanced reaction, and this resistance increase is attributed to a high-resistive Fe–O layer formation at the interface between the anode electrode and the low-resistive Fe–O layer. We proposed a simplified two-step model for the time evolution of the current under CVS [ICVS(t)]. The predicted ICVS(t) showed a good agreement with experimental results. The model also explained the field dependence of tr.en
dc.format.mimetypeapplication/pdf-
dc.language.isoeng-
dc.publisherAmerican Institute of Physicsen
dc.rights© 2010 American Institute of Physicsen
dc.subjectanodesen
dc.subjectcurrent densityen
dc.subjectelectrical resistivityen
dc.subjectiron compoundsen
dc.subjectthin filmsen
dc.titleModeling of field- and time-dependent resistance change phenomena under electrical stresses in Fe–O filmsen
dc.typejournal article-
dc.type.niitypeJournal Article-
dc.identifier.ncidAA00693547-
dc.identifier.jtitleJournal of Applied Physicsen
dc.identifier.volume107-
dc.identifier.issue1-
dc.relation.doi10.1063/1.3273405-
dc.textversionpublisher-
dc.identifier.artnum014518-
dcterms.accessRightsopen access-
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