Impacts of reduction of deep levels and surface passivation on carrier lifetimes in p-type 4H-SiC epilayers

Abstract

Impacts of reduction of deep levels and surface passivation on carrier lifetimes in p-type 4H-SiC epilayers are investigated. The authors reported that the carrier lifetime in n-type epilayers increased by reduction of deep levels through thermal oxidation and thermal annealing. However, the carrier lifetimes in p-type epilayers were not significantly enhanced. In this study, in order to investigate the influence of surface passivation on the carrier lifetimes, the epilayer surface was passivated by different oxidation techniques. While the improvement of the carrier lifetime in n-type epilayers was small, the carrier lifetime in p-type epilayers were remarkably improved by appropriate surface passivation. For instance, the carrier lifetime was improved from 1.4 μs to 2.6 μs by passivation with deposited SiO2 annealed in NO. From these results, it was revealed that surface recombination is a limiting factor of carrier lifetimes in p-type 4H-SiC epilayers.