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j.jcrysgro.2021.126299.pdf | 1.04 MB | Adobe PDF | 見る/開く |
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dc.contributor.author | Kato, Shota | en |
dc.contributor.author | Kim, Sanghong | en |
dc.contributor.author | Mizuta, Masahiko | en |
dc.contributor.author | Oshima, Masanori | en |
dc.contributor.author | Kano, Manabu | en |
dc.contributor.alternative | 加藤, 祥太 | ja |
dc.contributor.alternative | 金, 尚弘 | ja |
dc.contributor.alternative | 加納, 学 | ja |
dc.date.accessioned | 2022-08-10T08:54:03Z | - |
dc.date.available | 2022-08-10T08:54:03Z | - |
dc.date.issued | 2021-11-01 | - |
dc.identifier.uri | http://hdl.handle.net/2433/275826 | - |
dc.description.abstract | The present study proposes a gray-box (GB) model-based predictive control method to produce high-quality 300 mm silicon ingots in the commercial Czochralski (CZ) process. The GB model consists of an energy transfer, hydrodynamic, and geometrical model and a statistical model, predicts three controlled variables, i.e., crystal radius, growth rate, and melt position, and represents the time-varying and nonlinear characteristics of the CZ process. Solving an optimization problem with the GB model requires heavy computational load; therefore, the proposed method derives the prediction model by successive linearization of the GB model to compute optimal manipulated variables in several seconds. The proposed method was compared with the conventional method using PID controllers in disturbance rejection performance through control simulations. The results have demonstrated that the integral absolute error (IAE) of the proposed method was reduced by 60% on average and 89% at maximum even when a plant-model mismatch exists. | en |
dc.language.iso | eng | - |
dc.publisher | Elsevier BV | en |
dc.rights | © 2021. This manuscript version is made available under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International license. | en |
dc.rights | The full-text file will be made open to the public on 1 November 2023 in accordance with publisher's 'Terms and Conditions for Self-Archiving'. | en |
dc.rights | This is not the published version. Please cite only the published version. この論文は出版社版でありません。引用の際には出版社版をご確認ご利用ください。 | en |
dc.rights.uri | https://creativecommons.org/licenses/by-nc-nd/4.0/ | - |
dc.subject | A1. Gray-box model | en |
dc.subject | A1. Model predictive control (MPC) | en |
dc.subject | A1. Successive linearization | en |
dc.subject | A2. Czochralski method | en |
dc.subject | A2. Industrial crystallization | en |
dc.subject | B2. Semiconducting Silicon | en |
dc.title | Gray-box model-based predictive control of Czochralski process | en |
dc.type | journal article | - |
dc.type.niitype | Journal Article | - |
dc.identifier.jtitle | Journal of Crystal Growth | en |
dc.identifier.volume | 573 | - |
dc.relation.doi | 10.1016/j.jcrysgro.2021.126299 | - |
dc.textversion | author | - |
dc.identifier.artnum | 126299 | - |
dcterms.accessRights | open access | - |
datacite.date.available | 2023-11-01 | - |
dc.identifier.pissn | 0022-0248 | - |
dc.identifier.eissn | 1873-5002 | - |
出現コレクション: | 学術雑誌掲載論文等 |

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