このアイテムのアクセス数: 12

このアイテムのファイル:
ファイル 記述 サイズフォーマット 
adc8f9.pdf1.75 MBAdobe PDF見る/開く
完全メタデータレコード
DCフィールド言語
dc.contributor.authorFuji, Sotaen
dc.contributor.authorIsoda, Yosukeen
dc.contributor.authorLingling, Xieen
dc.contributor.authorHaruta, Mitsutakaen
dc.contributor.authorMajima, Takuyaen
dc.contributor.authorShimakawa, Yuichien
dc.contributor.authorKan, Daisukeen
dc.date.accessioned2025-04-21T02:21:52Z-
dc.date.available2025-04-21T02:21:52Z-
dc.date.issued2025-04-
dc.identifier.urihttp://hdl.handle.net/2433/293475-
dc.description.abstractWe epitaxially grew rutile-structured VO₂ films with various out-of-plane lattice constants on (001) TiO₂ substrates by pulsed laser deposition and investigated their protonation by electrochemically injecting protons to the films in transistor structures with gate layers of proton conducting Nafion membranes. We found that VO₂ films with out-of-plane lattice expansion are less protonated. On the basis of the experimental results, we discuss the correlation between the out-of-plane lattice expansion and protonation of (001) VO₂ epitaxial films and highlight that reducing lattice defects is key to promoting the protonation of VO₂ films.en
dc.language.isoeng-
dc.publisherIOP Publishingen
dc.rightsContent from this work may be used under the terms of the Creative Commons Attribution 4.0 license. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.en
dc.titleCorrelation between structural properties and electrochemical proton insertion in (001) VO₂ epitaxial filmsen
dc.typejournal article-
dc.type.niitypeJournal Article-
dc.identifier.jtitleApplied Physics Expressen
dc.identifier.volume18-
dc.identifier.issue4-
dc.relation.doi10.35848/1882-0786/adc8f9-
dc.textversionpublisher-
dcterms.accessRightsopen access-
dc.identifier.pissn1882-0778-
dc.identifier.eissn1882-0786-
出現コレクション:学術雑誌掲載論文等

アイテムの簡略レコードを表示する

Export to RefWorks


出力フォーマット 


このリポジトリに保管されているアイテムはすべて著作権により保護されています。