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タイトル: | Chemical reaction at high temperature and high pressure VII : solid state reaction of silicon with graphite to form silicon carbide and its stability |
著者: | Nakamura, Tokio Shimizu, Kiyoshi Osugi, Jiro |
著者名の別形: | ナカムラ, トキオ シミズ, キヨシ オオスギ, ジロウ |
発行日: | 10-Apr-1970 |
出版者: | The Physico-Chemical Society of Japan |
誌名: | The Review of Physical Chemistry of Japan |
巻: | 39 |
号: | 2 |
開始ページ: | 104 |
終了ページ: | 109 |
抄録: | The yield of SiC in the solid state reaction between Si and graphite powder has been studied at temperatures of 800~1, 100℃ under pressures of 10~50kb. The temperature of commencement of reaction is represented by 0.7×Tw°K (melting point of Si under pressure). The yield of SiC increases with increasing temperature and pressure, so that the rate determining step would be in the reaction process. The α--β transformation of SiC has been observed under pressure and it has been concluded thermodynamically that the β form SiC would be the stable species in the experimental conditions. |
URI: | http://hdl.handle.net/2433/46937 |
出現コレクション: | Vol.39 No.2 |
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