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dc.contributor.authorNakamura, Sen
dc.contributor.authorKimoto, Ten
dc.contributor.authorMatsunami, Hen
dc.date.accessioned2007-03-28T03:58:21Z-
dc.date.available2007-03-28T03:58:21Z-
dc.date.issued2002-
dc.identifier.issn0021-4922-
dc.identifier.urihttp://hdl.handle.net/2433/6145-
dc.language.isoeng-
dc.publisherINST PURE APPLIED PHYSICSen
dc.subjectsilicon carbide (SiC)en
dc.subjectchemical vapor deposition (CVD)en
dc.subjectdeep-level transient spectroscopy (DLTS)en
dc.subjectdeep-level transient Fourier spectroscopy (DLTFS)en
dc.subjectZ(1) centeren
dc.titleHigh-sensitivity analysis of Z(1) center concentration in 4H-SiC grown by horizontal cold-wall chemical vapor depositionen
dc.typejournal article-
dc.type.niitypeJournal Article-
dc.identifier.jtitleJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen
dc.identifier.volume41-
dc.identifier.issue5A-
dc.identifier.spage2987-
dc.identifier.epage2988-
dc.relation.doi10.1143/JJAP.41.2987-
dc.textversionnone-
dcterms.accessRightsmetadata only access-
Appears in Collections:Graduate School of Engineering Literature Database

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