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Title: Radical kinetics for polymer film deposition in fluorocarbon (C4F8, C3F6 and C5F8) plasmas
Authors: Takahashi, K
Itoh, A
Nakamura, T
Tachibana, K
Keywords: fluorocarbon film
plasma polymerization
low GWP alternative gas
C5F8
C4F8
C3F6
radical measurement
Issue Date: 2000
Publisher: ELSEVIER SCIENCE SA
Journal title: THIN SOLID FILMS
Volume: 374
Issue: 2
Start page: 303
End page: 310
URI: http://hdl.handle.net/2433/7546
DOI(Published Version): 10.1016/S0040-6090(00)01160-3
Link: Web of Science
Appears in Collections:Graduate School of Engineering Literature Database

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