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タイトル: | Adaptable Ultraviolet Reflecting Polymeric Multilayer Coatings of High Refractive Index Contrast |
著者: | Smirnov, José Raúl Castro Ito, Masateru Calvo, Mauricio Ernesto López-López, Carmen Jiménez-Solano, Alberto Galisteo-López, Juan Francisco Zavala-Rivera, Paul Tanaka, Koichiro https://orcid.org/0000-0002-2132-8318 (unconfirmed) Sivaniah, Easan https://orcid.org/0000-0001-7293-8370 (unconfirmed) Míguez, Hernán |
著者名の別形: | 田中, 耕一郎 伊藤, 真陽 |
キーワード: | Block copolymers Collective osmotic shock Photonic crystals Porous multilayers UV lithography |
発行日: | 1-Nov-2015 |
出版者: | Wiley-VCH Verlag |
誌名: | Advanced Optical Materials |
巻: | 3 |
開始ページ: | 1633 |
終了ページ: | 1639 |
抄録: | A synthetic route is demonstrated to build purely polymeric nanostructured multilayer coatings, adaptable to arbitrary surfaces, and capable of efficiently blocking by reflection a targeted and tunable ultraviolet (UV) range. Reflection properties are determined by optical interference between UV light beams reflected at the interfaces between polystyrene layers of different porosity and hence refractive index. As no dopant absorber intervenes in the shielding effect, polymer degradation effects are prevented. Alternated porosity results from the modulation of photochemical effects at the few tens of nanometers length scale, combined with the collective osmotic shock induced during the processing of the precursor diblock copolymer film. Experimental evidence of the application of this method to coat rough surfaces with smooth and conformal UV protecting films is provided. |
著作権等: | © 2015 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. This is an open access article under the terms of the Creative Commons Attribution-NonCommercial License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited and is not used for commercial purposes. |
URI: | http://hdl.handle.net/2433/218467 |
DOI(出版社版): | 10.1002/adom.201500209 |
出現コレクション: | 学術雑誌掲載論文等 |
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