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dc.contributor.authorMiyauchi, Yuheien
dc.contributor.authorKonabe, Satoruen
dc.contributor.authorWang, Feijiuen
dc.contributor.authorZhang, Wenjinen
dc.contributor.authorHwang, Alexanderen
dc.contributor.authorHasegawa, Yusukeen
dc.contributor.authorZhou, Lizhongen
dc.contributor.authorMouri, Shinichiroen
dc.contributor.authorToh, Minglinen
dc.contributor.authorEda, Gokien
dc.contributor.authorMatsuda, Kazunarien
dc.contributor.alternative宮内, 雄平ja
dc.contributor.alternative小鍋, 哲ja
dc.contributor.alternative長谷川, 勇介ja
dc.contributor.alternative毛利, 真一郎ja
dc.contributor.alternative松田, 一成ja
dc.date.accessioned2018-07-06T07:07:55Z-
dc.date.available2018-07-06T07:07:55Z-
dc.date.issued2018-07-03-
dc.identifier.issn2041-1723-
dc.identifier.urihttp://hdl.handle.net/2433/232612-
dc.description2次元半導体中で電子の波の情報が失われるメカニズムを解明 --将来の高速省エネルギー光デバイスの実現に期待--. 京都大学プレスリリース. 2018-07-06.ja
dc.description.abstractMonolayers of transition metal dichalcogenides (TMDC) have recently emerged as excellent platforms for exploiting new physics and applications relying on electronic valley degrees of freedom in two-dimensional (2D) systems. Here, we demonstrate that Coulomb screening by 2D carriers plays a critical role in excitonic valley pseudospin relaxation processes in naturally carrier-doped WSe2 monolayers (1L-WSe2). The exciton valley relaxation times were examined using polarization- and time-resolved photoluminescence spectroscopy at temperatures ranging from 10 to 160 K. We show that the temperature-dependent exciton valley relaxation times in 1L-WSe2 under various exciton and carrier densities can be understood using a unified framework of intervalley exciton scattering via momentum-dependent long-range electron–hole exchange interactions screened by 2D carriers that depend on the carrier density and the exciton linewidth. Moreover, the developed framework was successfully applied to engineer the valley polarization of excitons in 1L-WSe2. These findings may facilitate the development of TMDC-based opto-valleytronic devices.en
dc.format.mimetypeapplication/pdf-
dc.language.isoeng-
dc.publisherSpringer Natureen
dc.rights© The Author(s) 2018. This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.en
dc.subjectTwo-dimensional materialsen
dc.titleEvidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductorsen
dc.typejournal article-
dc.type.niitypeJournal Article-
dc.identifier.jtitleNature Communicationsen
dc.identifier.volume9-
dc.relation.doi10.1038/s41467-018-04988-x-
dc.textversionpublisher-
dc.identifier.artnum2598-
dc.identifier.pmid29968719-
dc.relation.urlhttps://www.kyoto-u.ac.jp/ja/research-news/2018-07-06-
dcterms.accessRightsopen access-
datacite.awardNumber16H00911-
datacite.awardNumber15K13337-
datacite.awardNumber15H05408-
datacite.awardNumber15F15313-
datacite.awardNumber26390007-
datacite.awardNumber26107522-
datacite.awardNumber25400324-
datacite.awardNumber26390007-
datacite.awardNumber15K13500-
datacite.awardNumber16H00910-
datacite.awardNumber16H06331-
datacite.awardNumber17K19055-
jpcoar.funderName日本学術振興会ja
jpcoar.funderName日本学術振興会ja
jpcoar.funderName日本学術振興会ja
jpcoar.funderName日本学術振興会ja
jpcoar.funderName日本学術振興会ja
jpcoar.funderName日本学術振興会ja
jpcoar.funderName日本学術振興会ja
jpcoar.funderName日本学術振興会ja
jpcoar.funderName日本学術振興会ja
jpcoar.funderName日本学術振興会ja
jpcoar.funderName日本学術振興会ja
jpcoar.funderName日本学術振興会ja
jpcoar.funderName.alternativeJapan Society for the Promotion of Science (JSPS)en
jpcoar.funderName.alternativeJapan Society for the Promotion of Science (JSPS)en
jpcoar.funderName.alternativeJapan Society for the Promotion of Science (JSPS)en
jpcoar.funderName.alternativeJapan Society for the Promotion of Science (JSPS)en
jpcoar.funderName.alternativeJapan Society for the Promotion of Science (JSPS)en
jpcoar.funderName.alternativeJapan Society for the Promotion of Science (JSPS)en
jpcoar.funderName.alternativeJapan Society for the Promotion of Science (JSPS)en
jpcoar.funderName.alternativeJapan Society for the Promotion of Science (JSPS)en
jpcoar.funderName.alternativeJapan Society for the Promotion of Science (JSPS)en
jpcoar.funderName.alternativeJapan Society for the Promotion of Science (JSPS)en
jpcoar.funderName.alternativeJapan Society for the Promotion of Science (JSPS)en
jpcoar.funderName.alternativeJapan Society for the Promotion of Science (JSPS)en
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